Dr. Hongbo Zhang
at Synopsys Inc
SPIE Involvement:
Author
Publications (18)

Proceedings Article | 26 March 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Lithographic illumination, Calibration, 3D modeling, Optical testing, Photomasks, Source mask optimization, Optical proximity correction, Performance modeling, Process modeling

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Semiconductors, Lithography, Electron beam lithography, Optical lithography, Manufacturing, Photomasks, Double patterning technology, Immersion lithography, Vestigial sideband modulation, Optical power tracking algorithms

Proceedings Article | 10 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Manufacturing, Legal, Printing, Photomasks, Immersion lithography, Standards development, Evolutionary algorithms

Proceedings Article | 9 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Lithographic illumination, Cadmium, Calibration, Error analysis, 3D modeling, Photomasks, Semiconducting wafers, Process modeling, Light

Proceedings Article | 9 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Data modeling, Polarization, Calibration, 3D modeling, Photomasks, Optical proximity correction, Statistical modeling, Performance modeling, 3D image processing

Showing 5 of 18 publications
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