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Hong-Cheon Yang
Applications Development Engineer at KLA Corp.
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Publications (4)
Proceedings Article | 27 April 2023 Poster + Paper
ADI to in-cell overlay stability improvement for DRAM using novel scatterometry and comprehensive process control
Proceedings Volume 12496, 124962E (2023) https://doi.org/10.1117/12.2657632
KEYWORDS: Overlay metrology, Semiconducting wafers, Advanced process control, Scanners, Scatterometry, Process control, Signal processing, Metrology, Control systems, Optical parametric oscillators
Proceedings Article | 27 April 2023 Poster + Paper
Residuals reduction in imaging-based overlay using color per layer
Shlomit Katz, Suk Won Park, Joonsang You, Hyunjun Kim, Honggoo Lee, Jungchan Kim, Dongyoung Lee, Hongbok Yeon, Joonseuk Lee, Sang-Ho Lee, Jae Wook Seo, Dor Yehuda, Junho Kim, Hongcheon Yang, Dohwa Lee, Nanglyeom Oh, Dongsub Choi, Wayne Zhou, Hedvi Spielberg, Ohad Bachar
Proceedings Volume 12496, 1249626 (2023) https://doi.org/10.1117/12.2655681
KEYWORDS: Metrology, Overlay metrology, High volume manufacturing, Optical parametric oscillators, Optical gratings, Visualization
Proceedings Article | 27 April 2023 Presentation + Paper
Enhancement of overlay metrology accuracy by multi-wavelength scatterometry with rotated quadrupole illumination
Hyunsok Kim, Ikhyun Jeong, Baikkyu Hong, Sunouk Nam, Sumin Jang, Kangmin Lee, Hongpeng Su, Minho Jeong, Mingyu Kim, Hongcheon Yang, Wayne Zhou, Nanglyeom Oh, Dongsub Choi, Tal Yaziv, Hedvi Spielberg, Ohad Bachar, Rawi Dirawi
Proceedings Volume 12496, 1249620 (2023) https://doi.org/10.1117/12.2657678
KEYWORDS: Overlay metrology, Light sources and illumination, Metrology, Signal detection, Scatterometry, Diffraction, Semiconducting wafers, Etching, Tunable lasers, Signal processing
Proceedings Article | 13 March 2018 Paper
Improved control of multi-layer overlay in advanced 8nm logic nodes
Tae-Sun Kim, Young-Sik Park, Yong-Chul Kim, Byoung-Hoon Kim, Ji-Hun Lee, Min-Keun Kwak, Sung-Won Choi, Joon-Soo Park, Hong-Cheon Yang, Philipp Meixner, Dong-jin Lee, Oh-Sung Kwon, Hyun-Su Kim, Jin-Tae Park, Sung-Min Lee, Cedric Grouwstra, Vidar van der Meijden, Mohamed El Kodadi, Chris Kim, Pierre-Yves Guittet, Tjitte Nooitgedagt
Proceedings Volume 10585, 1058527 (2018) https://doi.org/10.1117/12.2297099
KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Overlay metrology, Logic, Metrology, Diffraction, Target acquisition, Performance modeling, Diffraction gratings
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