Hongyi Liu
at Peking Univ
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 22, 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Lithography, Optical lithography, Etching, Error analysis, Process control, Photomasks, Critical dimension metrology, Failure analysis, Probability theory, Yield improvement, Phase only filters

PROCEEDINGS ARTICLE | March 16, 2016
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Logic, Optical lithography, Electrodes, Metals, Gallium arsenide, Transistors, Field effect transistors, Structural design, Standards development, Nanowires

PROCEEDINGS ARTICLE | March 16, 2016
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Lithography, Optical lithography, Cadmium, Detection and tracking algorithms, Etching, Metals, Manufacturing, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Algorithm development, Array processing, Chemical mechanical planarization, Design for manufacturability

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Optical lithography, Data modeling, Databases, Double patterning technology, Critical dimension metrology, Molybdenum, Optimization (mathematics), Yield improvement, Performance modeling, Hybrid optics

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Electron beam lithography, Optical lithography, Cadmium, Detection and tracking algorithms, Etching, Photomasks, Double patterning technology, Critical dimension metrology, Algorithm development, Hybrid optics

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