Hoon Namkung
at Hynix Semiconductor
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | July 9, 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Optical lithography, Defect detection, Silica, Quartz, Particles, Light scattering, Surface roughness, Distortion, Photomasks, Critical dimension metrology

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