Detection of a single nanoparticle on a bare silicon wafer has been a challenge in the semiconductor industry for decades. Currently, the most successful and widely used technique is dark-field microscopy. However, it is not capable of detecting single sub-10 nm particles owing to a low signal-to-noise ratio (SNR). As a new approach, we suggest using the second harmonic generation (SHG) to detect a single nanoparticle. The second harmonic generation in centrosymmetric materials, like silicon, is forbidden except for a thin and additionally increase local field factors, allowing for their persistent detection. Choosing the proper surface and increasing SNR. We demonstrate the feasibility of the nonlinear dark-field microscopy concept by detecting an isolated 80-nm silicon nanoparticle on the silicon wafer.