Hoyeon Kim
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 24 March 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Reticles, Logic, Scanners, Manufacturing, Pellicles, Transmittance, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Chemical elements

Proceedings Article | 20 April 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Metrology, Data modeling, Image processing, Denoising, Inspection, Scanning electron microscopy, Photoresist materials, Line width roughness, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 23 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Lithography, Monochromatic aberrations, Aberration correction, Metrology, Scanners, Solids, Projection systems, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Etching, Manufacturing, Photomasks, Line width roughness, Beam shaping, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Overlay metrology

Proceedings Article | 20 March 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Lithography, Electron beam lithography, Etching, Manufacturing, Photomasks, Line width roughness, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Overlay metrology

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top