Hrishi Shende
Engineer at MP Mask Technology Ctr LLC
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 28 June 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Argon, Particles, Energy transfer, Gases, Photomasks, SRAF, Cavitation, Acoustics, Stereolithography, Liquids

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Particles, Ions, Chemistry, Inspection, Photomasks, SRAF, Cavitation, Acoustics, Stereolithography, Liquids

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Particles, Energy transfer, Interfaces, Gases, Chemistry, Photomasks, SRAF, Cavitation, Acoustics, Sonoluminescence

Proceedings Article | 29 March 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Chemical species, Photons, Transducers, Photomasks, Cavitation, Acoustics, Semiconducting wafers, Liquids, Sonoluminescence, Acoustic cavitation

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Argon, Chemical species, Particles, Photomasks, Extreme ultraviolet, Cavitation, Acoustics, Systems modeling, Liquids, Acoustic cavitation

Showing 5 of 6 publications
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