Hua-Tai Lin
Deputy Director at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 8 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Semiconductors, Lithography, Electron beam lithography, Metrology, Optical lithography, Image processing, Process control, Photomasks, Optical proximity correction, Mask making, Critical dimension metrology, Performance modeling, 193nm lithography

Proceedings Article | 18 March 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Diffraction, Optical lithography, Lithographic illumination, Spatial frequencies, Head, Photomasks, Shape analysis, Optical proximity correction, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Optical lithography, Lithographic illumination, Detection and tracking algorithms, Image segmentation, Photomasks, Semiconductor manufacturing, Immersion lithography, Optical proximity correction, Neodymium, Resolution enhancement technologies

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Diffraction, Data modeling, Polarization, Signal attenuation, Pellicles, Projection systems, Photomasks, Immersion lithography, Optical proximity correction, Critical dimension metrology

Proceedings Article | 20 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Genetic algorithms, Image segmentation, Artificial neural networks, Neural networks, Optical proximity correction, Optimization (mathematics), Semiconducting wafers, Systems modeling, Model-based design

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Wafer-level optics, Lithography, Genetic algorithms, Optical lithography, Data modeling, Photomasks, Optical proximity correction, Optimization (mathematics), Semiconducting wafers, Model-based design

Showing 5 of 9 publications
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