Dr. Hua-Yu Liu
Vice President, Computational Lithography Products at ASML Brion
SPIE Involvement:
Author
Publications (58)

PROCEEDINGS ARTICLE | March 16, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Diffraction, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Critical dimension metrology, Line edge roughness, Stochastic processes, Personal protective equipment, Resolution enhancement technologies

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Deep ultraviolet, Scanners, 3D modeling, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Algorithm development, Optimization (mathematics), Fiber optic illuminators

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Logic, Data modeling, Calibration, Electroluminescence, Finite element methods, Photomasks, Source mask optimization, Optical proximity correction, Semiconducting wafers

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Metrology, Data modeling, Calibration, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Data modeling, Diffusion, Computer simulations, 3D modeling, Photomasks, Optical proximity correction, Semiconducting wafers, Performance modeling, 3D image processing

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Etching, Image processing, Electroluminescence, Scanning electron microscopy, Finite element methods, Source mask optimization, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Showing 5 of 58 publications
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