Dr. Huai Huang
at IBM Research
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 2 July 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Copper, Scatterometry, Machine learning

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconductors, Modeling, Metrology, Modulation, 3D modeling, Scanning electron microscopy, Optical metrology, Process control, Photomasks, Extreme ultraviolet, Line width roughness, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Edge roughness

Proceedings Article | 24 March 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Semiconductors, Optical imaging, Lithography, Metrology, Modulation, Etching, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing, Semiconducting wafers, Edge roughness

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