Hui Peng Koh
Director at GlobalFoundries
SPIE Involvement:
Author
Publications (16)

Proceedings Article | 20 March 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Optical lithography, Etching, Image processing, Photomasks, Double patterning technology, Nanoimprint lithography, Critical dimension metrology, Neodymium, Photoresist processing, Binary data

Proceedings Article | 8 October 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Reticles, Contamination, Defect detection, Air contamination, Particles, Inspection, Image analysis, Photomasks, Optical proximity correction, SRAF

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Optical lithography, Deep ultraviolet, Metals, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers, Overlay metrology

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Optical filters, Reticles, Metrology, Image processing, Scanners, Image quality, Optical alignment, Semiconducting wafers, Overlay metrology, Chemical mechanical planarization

SPIE Journal Paper | 17 December 2013
JM3 Vol. 12 Issue 04
KEYWORDS: Point spread functions, Modulation transfer functions, Extreme ultraviolet lithography, Reticles, Extreme ultraviolet, Light scattering, Scattering, Photomasks, Scanning electron microscopy, Semiconducting wafers

Showing 5 of 16 publications
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