Mr. Huichan Yun Profile

Huichan Yun

at SAMSUNG SDI

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 27 March 2017 Paper

Study of flowability effect on self-planarization performance at SOC materials

Huichan Yun, Jinhyung Kim, Youjung Park, Yoona Kim, Seulgi Jeong, Jaeyeol Baek, Byeri Yoon, Sanghak Lim

Proceedings Volume 10146, 1014624 (2017) https://doi.org/10.1117/12.2257880

KEYWORDS: System on a chip, Carbon, Double patterning technology, Polymers, Etching, Resistance, Fourier transforms, Optical lithography, Optical properties, Coating

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Proceedings Article | 27 March 2014 Paper

Decreasing curing temperature of spin-on dielectrics by using additives

Jin Hee Bae, Kwen Woo Han, Eun Su Park, Hui Chan Yoon, Yoong Hee Na, Jin Woo Seo, Wan Hee Lim, Bo Sun Kim, Jun Young Jang, Younjin Cho

Proceedings Volume 9051, 90511R (2014) https://doi.org/10.1117/12.2046098

KEYWORDS: Dielectrics, Silicon, Silica, Oxides, Semiconductors, Etching, Resistance, Manufacturing, Polymers, Plasma

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Proceedings Article | 20 March 2012 Paper

Tunable resin reactivity of spin-on dielectric by controlling synthesis process

Kwen Woo Han, Hyun-Ji Song, Mi-Young Kim, Eun Su Park, Hui Chan Yoon, Go Eun Kim, Sang Hak Lim, Sang Kyun Kim

Proceedings Volume 8325, 83252B (2012) https://doi.org/10.1117/12.916252

KEYWORDS: Dielectrics, Silica, Semiconductors, Semiconducting wafers, Process control, Chemical vapor deposition, Polymers, Wet etching, Etching, Plasma

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Proceedings Article | 1 April 2009 Paper

Controlling etch properties of silicon-based antireflective spin-on hardmask materials

Sang Kyun Kim, Hyeon Mo Cho, Changsoo Woo, Sang Ran Koh, Mi-Young Kim, Hui Chan Yoon, Woojin Lee, Seung-Wook Shin, Jong Seob Kim, Tuwon Chang

Proceedings Volume 7273, 727313 (2009) https://doi.org/10.1117/12.814075

KEYWORDS: Etching, Silicon, Chromophores, Optical properties, Lithography, Resistance, Plasma, Optical lithography, Reflectivity, Oxygen

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Proceedings Article | 4 December 2008 Paper

Optimization of optical properties of silicon-based anti-reflective spin-on hardmask materials

Sang Kyun Kim, Hyeon Mo Cho, Changsoo Woo, Sang Ran Koh, Mi-Young Kim, Hui Chan Yoon, Woojin Lee, Seung-Wook Shin, Jong-Seob Kim, Tuwon Chang

Proceedings Volume 7140, 71402V (2008) https://doi.org/10.1117/12.804399

KEYWORDS: Chromophores, Etching, Optical properties, Silicon, Lithography, Optical lithography, Reflectivity, Resistance, Coating, Plasma

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Proceedings Article | 26 March 2008 Paper

Silicon-based anti-reflective spin-on hardmask materials for 45 nm pattern of immersion ArF lithography

Sang Kyun Kim, Hyeon Mo Cho, Sang Ran Koh, Mi-young Kim, Hui Chan Yoon, Yong-jin Chung, Jong Seob Kim, Tuwon Chang

Proceedings Volume 6923, 69232Q (2008) https://doi.org/10.1117/12.773117

KEYWORDS: Silicon, Etching, Lithography, Chromophores, Resistance, Photoresist materials, Optical lithography, Chemical vapor deposition, Semiconducting wafers, Silicon carbide

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Proceedings Article | 2 April 2007 Paper

Spin-on Organic Hardmask Materials in 70nm Devices

Chang-Il Oh, Dong-Seon Uh, Do-Hyeon Kim, Jin-Kuk Lee, Hui-Chan Yun, Irina Nam, Min-Soo Kim, Kyong-Ho Yoon, Kyung-Hee Hyung, Nataliya Tokareva, Hwan-Sung Cheon, Jong-Seob Kim, Tu-Won Chang

Proceedings Volume 6519, 65192R (2007) https://doi.org/10.1117/12.711720

KEYWORDS: Etching, Photoresist processing, Polymers, Lithography, Silicon, Semiconducting wafers, Reflectivity, Carbon, Particles, Plasma

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Proceedings Article | 30 March 2007 Paper

Silicon-based anti-reflective spin-on hardmask materials with improved storage stability for 193-nm lithography

Sang Kyun Kim, Sang Hak Lim, Do-hyeon Kim, Sang Ran Koh, Mi-young Kim, Hui Chan Yoon, Dong Seon Uh, Jong Seob Kim, Tuwon Chang

Proceedings Volume 6519, 65190O (2007) https://doi.org/10.1117/12.711866

KEYWORDS: Silicon, Etching, Lithography, Photoresist materials, Photomasks, Polymers, Plasma, Reflectivity, Thin film coatings, Chemical vapor deposition

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Showing 5 of 8 publications

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