Huichan Yun
at SAMSUNG SDI
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: System on a chip, Carbon, Double patterning technology, Polymers, Etching, Resistance, Fourier transforms, Optical lithography, Optical properties, Coating

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Dielectrics, Silicon, Silica, Oxides, Semiconductors, Etching, Resistance, Manufacturing, Polymers, Plasma

PROCEEDINGS ARTICLE | March 20, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Dielectrics, Silica, Semiconductors, Semiconducting wafers, Process control, Chemical vapor deposition, Polymers, Wet etching, Etching, Plasma

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Etching, Silicon, Chromophores, Optical properties, Lithography, Resistance, Plasma, Optical lithography, Reflectivity, Oxygen

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Chromophores, Etching, Optical properties, Silicon, Lithography, Optical lithography, Reflectivity, Resistance, Coating, Plasma

PROCEEDINGS ARTICLE | March 26, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Silicon, Etching, Lithography, Chromophores, Resistance, Photoresist materials, Optical lithography, Chemical vapor deposition, Semiconducting wafers, Silicon carbide

Showing 5 of 8 publications
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