Dr. Hung-Chang Hsieh
deputy director at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (14)

SPIE Journal Paper | 1 October 2005
JM3 Vol. 4 Issue 04
KEYWORDS: Thin films, Wave propagation, Magnetism, Optical lithography, Critical dimension metrology, Interfaces, Scanners, Absorption, Lithography, Multilayers

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Oxides, Lithography, Electron beam lithography, Etching, Error analysis, Monte Carlo methods, Photomasks, Mask making, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Modulation, Etching, Chromium, Photomasks, Semiconductor manufacturing, Optical proximity correction, Critical dimension metrology, Data conversion, Forward error correction, Semiconducting wafers

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Sensors, Calibration, Inspection, Temperature sensors, Photomasks, Critical dimension metrology, Optimization (mathematics), Sensor calibration, Temperature metrology, Chemically amplified resists

SPIE Journal Paper | 1 April 2004
JM3 Vol. 3 Issue 02
KEYWORDS: Critical dimension metrology, Calibration, Sensors, Sensor calibration, Temperature metrology, Photomasks, Chemically amplified resists, Optimization (mathematics), Temperature sensors, Mask making

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Human-machine interfaces, Lithography, Detection and tracking algorithms, Sensors, Photomasks, Neodymium, Optimization (mathematics), Photoresist processing, Temperature metrology, Chemically amplified resists

Showing 5 of 14 publications
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