Hung-Eil Kim
SMTS at Spansion Inc
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Reticles, Chromium, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 26 April 2001
Proc. SPIE. 4404, Lithography for Semiconductor Manufacturing II
KEYWORDS: Lithography, Monochromatic aberrations, Polymers, Printing, Photomasks, Optical proximity correction, Critical dimension metrology, Photoresist processing, Binary data, Back end of line

Proceedings Article | 26 July 1999
Proc. SPIE. 3679, Optical Microlithography XII
KEYWORDS: Cadmium, Image processing, Scanners, Printing, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Binary data, Phase shifts

Proceedings Article | 11 June 1999
Proc. SPIE. 3678, Advances in Resist Technology and Processing XVI
KEYWORDS: Deep ultraviolet, Etching, Argon, Dry etching, Ions, Resistance, Photoresist materials, Ion implantation, Photoresist processing, Chemically amplified resists

Proceedings Article | 29 June 1998
Proc. SPIE. 3334, Optical Microlithography XI
KEYWORDS: Lithography, Etching, Printing, Transmittance, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Phase shifts, Defect inspection

Proceedings Article | 7 June 1996
Proc. SPIE. 2726, Optical Microlithography IX
KEYWORDS: Lithography, Deep ultraviolet, Quartz, Light scattering, Scanning electron microscopy, Printing, Photomasks, Critical dimension metrology, Semiconducting wafers, Phase shifts

Showing 5 of 13 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top