Hung-Liang Huang
Student at National Chiao Tung Univ
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, Databases, Image processing, Silicon, Manufacturing, Data acquisition, Photomasks, Optical proximity correction, Semiconducting wafers, Reverse engineering

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