Dr. Hwan-Sung Cheon Profile

Dr. Hwan-Sung Cheon

at SAMSUNG SDI Co Ltd

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 1 April 2009 Paper

Organic underlayer materials with exceptionally high thermal stability

Hwan-Sung Cheon, Kyong-Ho Yoon, Min-Soo Kim, Sung Bae Oh, Jee-Yun Song, Nataliya Tokareva, Jong-Seob Kim, Tuwon Chang

Proceedings Volume 7273, 727310 (2009) https://doi.org/10.1117/12.814082

KEYWORDS: Polymers, Carbon, Etching, Chemical vapor deposition, Silicon, Lithography, Semiconducting wafers, Resistance, Coating, Silicon carbide

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Proceedings Article | 4 December 2008 Paper

Development of spin-on carbon hardmasks with comparable etch resistance to Amorphous Carbon Layer (ACL)

Hwan-Sung Cheon, Kyong-Ho Yoon, Min-Soo Kim, Seung Bae Oh, Jee-Yun Song, Nataliya Tokareva, Jong-Seob Kim, Tuwon Chang

Proceedings Volume 7140, 71402R (2008) https://doi.org/10.1117/12.804635

KEYWORDS: Carbon, Etching, Resistance, Polymers, Polymerization, Plasma etching, Plasma, Lithography, Silicon, Coating

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Proceedings Article | 4 December 2008 Paper

Use of spin-on-hard mask materials for nano scale patterning technology

Wen-Hao Wu, Edward Chang, Hwan-Sung Cheon, Sang Kyun Kim, Hyeon Mo Cho, Kyong-Ho Yoon, Jong Seob Kim, Tuwon Chang, Seongho Shin

Proceedings Volume 7140, 71402Q (2008) https://doi.org/10.1117/12.804695

KEYWORDS: Etching, Silicon, Scanning electron microscopy, Photoresist materials, Oxygen, Photomasks, Nanotechnology, Plasma, Optical lithography, Carbon

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Proceedings Article | 26 March 2008 Paper

Novel spin-on organic hardmask with high plasma etch resistance

Chang-Il Oh, Jin-Kuk Lee, Min-Soo Kim, Kyong-Ho Yoon, Hwan-Sung Cheon, Nataliya Tokareva, Jee-Yun Song, Jong-Seob Kim, Tu-Won Chang

Proceedings Volume 6923, 69232V (2008) https://doi.org/10.1117/12.771758

KEYWORDS: Etching, Resistance, Plasma etching, Carbon, Polymers, Plasma, Chemical species, Lithography, Dry etching, Chemical vapor deposition

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Proceedings Article | 2 April 2007 Paper

Spin-on Organic Hardmask Materials in 70nm Devices

Chang-Il Oh, Dong-Seon Uh, Do-Hyeon Kim, Jin-Kuk Lee, Hui-Chan Yun, Irina Nam, Min-Soo Kim, Kyong-Ho Yoon, Kyung-Hee Hyung, Nataliya Tokareva, Hwan-Sung Cheon, Jong-Seob Kim, Tu-Won Chang

Proceedings Volume 6519, 65192R (2007) https://doi.org/10.1117/12.711720

KEYWORDS: Etching, Photoresist processing, Polymers, Lithography, Silicon, Semiconducting wafers, Reflectivity, Carbon, Particles, Plasma

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