Hye-Jin Shin
at SK Hynix Inc
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Optical lithography, Data modeling, Control systems, Distortion, Process control, Photomasks, Optical alignment, Semiconducting wafers, Overlay metrology, Chemical mechanical planarization

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Diffraction, Optical lithography, Polarization, Scanners, Chromium, Transmittance, Photomasks, Nanoimprint lithography, Binary data

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Optical lithography, Diffractive optical elements, Printing, Source mask optimization, SRAF, Photoresist processing, Semiconducting wafers, Resolution enhancement technologies, Fiber optic illuminators

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Data modeling, Calibration, Etching, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Model-based design, Resolution enhancement technologies, Instrument modeling

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Atrial fibrillation, Calibration, Scanners, Manufacturing, Distance measurement, Photomasks, Optical proximity correction, SRAF, Optimization (mathematics)

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Optical lithography, Etching, Printing, Photomasks, Transistors, Critical dimension metrology, Photoresist processing, Binary data, 3D image processing

Showing 5 of 6 publications
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