Hye Rim Ji
Application Engineer at Carl Zeiss Co Ltd
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 9 July 2015 Paper
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Optical lithography, Iron, Metals, Particles, Photomasks, Extreme ultraviolet, Aluminum, Extreme ultraviolet lithography, Critical dimension metrology, Mass attenuation coefficient

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