Hye-Sung Lee
at Dongbu HiTek Co Ltd
SPIE Involvement:
Publications (5)

Proceedings Article | 16 March 2009 Paper
Proceedings Volume 7274, 727423 (2009) https://doi.org/10.1117/12.814153
KEYWORDS: Calibration, Data modeling, Process modeling, Optical proximity correction, Lithography, Semiconducting wafers, Scanning electron microscopy, Photomasks, Image processing, Critical dimension metrology

Proceedings Article | 17 October 2008 Paper
Hyesung Lee, Yeon-Ah Shim, Jae-Young Choi, Kwang-Seon Choi, Joanne Wu, Bo Su, Xinwei Zhou, Kenny Kim
Proceedings Volume 7122, 712221 (2008) https://doi.org/10.1117/12.801421
KEYWORDS: Optical proximity correction, Design for manufacturing, Nanoimprint lithography, Design for manufacturability, Semiconducting wafers, Lithography, Silicon, Wafer manufacturing, Yield improvement, Manufacturing

Proceedings Article | 17 October 2008 Paper
Jae-Hyun Kang, Jae-Young Choi, Yeon-Ah Shim, Hye-Sung Lee, Bo Su, Walter Chan, Ping Zhang, Joanne Wu, Keun-Young Kim
Proceedings Volume 7122, 71221N (2008) https://doi.org/10.1117/12.801312
KEYWORDS: Optical proximity correction, Design for manufacturing, Lithography, Scanning electron microscopy, Detection and tracking algorithms, Databases, Bridges, Model-based design, Fuzzy logic, Defect detection

Proceedings Article | 1 April 2008 Paper
Hyesung Lee, Jaeyoung Choi, Jeahee Kim, Jaewon Han, Keun-Young Kim
Proceedings Volume 6924, 69244B (2008) https://doi.org/10.1117/12.773017
KEYWORDS: Nanoimprint lithography, Resolution enhancement technologies, Optical lithography, Photomasks, Critical dimension metrology, Diffractive optical elements, SRAF, Photoresist processing, Lithography, Optical proximity correction

Proceedings Article | 16 November 2007 Paper
Proceedings Volume 6730, 673058 (2007) https://doi.org/10.1117/12.746821
KEYWORDS: Optical proximity correction, Systems modeling, Data modeling, Diffusion, Model-based design, Calibration, Lithography, Critical dimension metrology, Process modeling, Image processing

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