Hye-Sung Lee
at Dongbu HiTek Co Ltd
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Data modeling, Calibration, Image processing, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Process modeling

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Lithography, Silicon, Manufacturing, Design for manufacturing, Optical proximity correction, Nanoimprint lithography, Semiconducting wafers, Yield improvement, Wafer manufacturing, Design for manufacturability

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Lithography, Defect detection, Detection and tracking algorithms, Databases, Scanning electron microscopy, Bridges, Design for manufacturing, Optical proximity correction, Model-based design, Fuzzy logic

Proceedings Article | 1 April 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Optical lithography, Diffractive optical elements, Photomasks, Optical proximity correction, SRAF, Nanoimprint lithography, Critical dimension metrology, Photoresist processing, Resolution enhancement technologies

Proceedings Article | 16 November 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Data modeling, Calibration, Image processing, Diffusion, Optical proximity correction, Critical dimension metrology, Systems modeling, Model-based design, Process modeling

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