Hye-Young Kang
at Hanyang Univ
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Semiconductors, Ellipsometry, Lithography, Air contamination, Electroluminescence, Pellicles, Spectroscopic ellipsometry, Transmittance, Photomasks, Critical dimension metrology

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Mathematical modeling, Thin films, Lithography, Glasses, Interfaces, Optical proximity correction, Critical dimension metrology, Motion models, Photoresist processing, Resolution enhancement technologies

Proceedings Article | 15 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Lithographic illumination, Scattering, Chromium, Electroluminescence, Photomasks, Optical proximity correction, Binary data, Resolution enhancement technologies, Phase shifts

Proceedings Article | 8 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Semiconductors, Electronics, Scattering, Diffusion, Photomasks, Optical proximity correction, Critical dimension metrology, Applied physics, Semiconducting wafers, Chemically amplified resists

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Optical properties, Polymers, Diffusion, Photoresist materials, Photomasks, Absorbance, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers

Showing 5 of 6 publications
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