Dr. Hyeong-Soo Kim
Research Fellow at SK Hynix Inc
SPIE Involvement:
Author
Publications (42)

Proceedings Article | 27 March 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Semiconductors, Optical lithography, Etching, Inspection, Process control, Photoresist processing, Semiconducting wafers, Tolerancing, System on a chip, Factor analysis, Plasma

Proceedings Article | 18 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Metrology, Image compression, Resistance, Inspection, Control systems, Electroluminescence, Photomasks, Nanoimprint lithography, Critical dimension metrology, Line edge roughness, Semiconducting wafers

Proceedings Article | 15 March 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Optical lithography, Scattering, Etching, Photomasks, Chemical analysis, SRAF, Mask making, Critical dimension metrology, Stray light, Semiconducting wafers, Chemical mechanical planarization

Proceedings Article | 31 March 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Optical lithography, Etching, Image processing, Coating, Extreme ultraviolet lithography, Double patterning technology, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Proceedings Article | 26 March 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Optical lithography, Etching, Scanners, Materials processing, Bridges, Photomasks, Line width roughness, Immersion lithography, Photoresist processing, Semiconducting wafers

Proceedings Article | 22 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Point spread functions, Optical lithography, Light scattering, Surface roughness, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Convolution, Stray light

Showing 5 of 42 publications
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