Dr. Hyesook Hong
Sr. Lithography Engineer at
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Metals, Silicon, Manufacturing, Scanning electron microscopy, Design for manufacturing, Photomasks, Optical proximity correction, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 1 August 2002
Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX
KEYWORDS: Reticles, Metrology, Calibration, Etching, Pellicles, Process control, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Proceedings Article | 12 July 2002
Proc. SPIE. 4692, Design, Process Integration, and Characterization for Microelectronics
KEYWORDS: Optical lithography, Cadmium, Etching, Dielectrics, Nitrogen, Scanning electron microscopy, Photoresist materials, Critical dimension metrology, Semiconducting wafers, Plasma

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