Hyo Jung Roh
at Dongjin Semichem Co Ltd
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Etching, Polymers, Reflectivity, Photoresist materials, Double patterning technology, Critical dimension metrology, Photoresist developing, Temperature metrology, Bottom antireflective coatings

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Semiconductors, Lithography, Refractive index, Etching, Polymers, Materials processing, Reflectivity, Photoresist materials, Photoresist processing, Photorefractive polymers

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