Hyo Chun Kang
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Semiconductors, Metrology, Distortion, Image analysis, Image filtering, Line width roughness, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Edge roughness

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Electronics, Sensors, Electron microscopes, Control systems, Image analysis, Scanning electron microscopy, Image quality, Critical dimension metrology, Semiconducting wafers, Electron transport

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Semiconductors, Metrology, Optical lithography, Distortion, Line width roughness, Holmium, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Edge roughness

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