Hyoung-Ryeun Kim
at SK Hynix Inc
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Contamination, Dielectrics, Interfaces, Silicon, Coating, Silicon films, Semiconductor manufacturing, Fluorine, Semiconducting wafers, Chemical mechanical planarization

PROCEEDINGS ARTICLE | March 21, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Oxides, Lithography, Optical lithography, Lithographic illumination, Etching, Scanning electron microscopy, Photoresist materials, Cadmium sulfide, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Quartz, Scanners, Photography, Manufacturing, Photomasks, Optical proximity correction, Device simulation

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Semiconductors, Oxides, Lithography, Optical lithography, Cadmium, Etching, Photoresist materials, Photoresist processing, Semiconducting wafers, 193nm lithography

PROCEEDINGS ARTICLE | June 26, 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Lithographic illumination, Etching, Printing, Photomasks, Optical proximity correction, Critical dimension metrology, Forward error correction, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | June 12, 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Semiconductors, Lithography, Monochromatic aberrations, Silicon, Reliability, Electroluminescence, Photomasks, Cadmium sulfide, Photoresist processing, 193nm lithography

Showing 5 of 6 publications
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