Hyoung-Soon Yune
Member, Research Staff at SK Hynix Inc
SPIE Involvement:
Publications (14)

Proceedings Article | 20 March 2018 Presentation + Paper
Proceedings Volume 10587, 105870L (2018) https://doi.org/10.1117/12.2297659
KEYWORDS: SRAF, Lithography, Optical proximity correction, Optical lithography

Proceedings Article | 16 March 2016 Paper
Doyoun Kim, Hyoungsoon Yune, Daejin Park, Joohong Jeong, Woosung Moon, Mingu Kim, Seyoung Oh, Chanha Park, Hyunjo Yang
Proceedings Volume 9780, 97800D (2016) https://doi.org/10.1117/12.2218858
KEYWORDS: Lithography, Source mask optimization, Optical lithography, Semiconducting wafers, Wafer-level optics, Critical dimension metrology, Ultraviolet radiation, Image compression, Photomasks, Atrial fibrillation

Proceedings Article | 12 April 2013 Paper
Jongwon Jang, Hyungjeong Jeong, Hyungsoon Yune, Seyoung Oh, Hyunjo Yang, Donggyu Yim
Proceedings Volume 8683, 86831V (2013) https://doi.org/10.1117/12.2011659
KEYWORDS: SRAF, Photomasks, Optical proximity correction, Metals, Modulation, Scanning electron microscopy, Scanners, Cadmium sulfide, Semiconducting wafers, Double patterning technology

Proceedings Article | 23 March 2011 Paper
James Moon, Byoung-Sub Nam, Cheol-Kyun Kim, Hyong-Sun Yun, Ji-Young Lee, Donggyu Yim, Sung-Ki Park
Proceedings Volume 7973, 79732H (2011) https://doi.org/10.1117/12.879201
KEYWORDS: SRAF, Optical proximity correction, Semiconducting wafers, Photomasks, Performance modeling, Electroluminescence, Mask making, Scanning electron microscopy, Wafer testing, Lithography

Proceedings Article | 23 March 2011 Paper
Proceedings Volume 7973, 79732N (2011) https://doi.org/10.1117/12.879206
KEYWORDS: Photomasks, Resolution enhancement technologies, Electroluminescence, Optical lithography, Semiconducting wafers, Mask making, Scanning electron microscopy, Lithography, Double patterning technology, Image processing

Showing 5 of 14 publications
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