Hyoung-Soon Yune
Member, Research Staff at SK Hynix Inc
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 20 March 2018 Presentation + Paper
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Optical lithography, Optical proximity correction, SRAF

Proceedings Article | 16 March 2016 Paper
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Wafer-level optics, Lithography, Optical lithography, Image compression, Atrial fibrillation, Ultraviolet radiation, Photomasks, Source mask optimization, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 12 April 2013 Paper
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Modulation, Metals, Scanners, Scanning electron microscopy, Photomasks, Cadmium sulfide, Double patterning technology, Optical proximity correction, SRAF, Semiconducting wafers

Proceedings Article | 23 March 2011 Paper
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Optical lithography, Image processing, Electroluminescence, Scanning electron microscopy, Photomasks, Double patterning technology, Mask making, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 23 March 2011 Paper
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Electroluminescence, Scanning electron microscopy, Photomasks, Optical proximity correction, SRAF, Mask making, Semiconducting wafers, Wafer testing, Performance modeling

Showing 5 of 14 publications
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