Hyoung-Soon Yune
Member, Research Staff at SK Hynix Inc
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: SRAF, Lithography, Optical proximity correction, Optical lithography

Proceedings Article | 16 March 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Source mask optimization, Optical lithography, Semiconducting wafers, Wafer-level optics, Critical dimension metrology, Ultraviolet radiation, Image compression, Photomasks, Atrial fibrillation

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: SRAF, Photomasks, Optical proximity correction, Metals, Modulation, Scanning electron microscopy, Scanners, Cadmium sulfide, Semiconducting wafers, Double patterning technology

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Photomasks, Resolution enhancement technologies, Electroluminescence, Optical lithography, Semiconducting wafers, Mask making, Scanning electron microscopy, Lithography, Double patterning technology, Image processing

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: SRAF, Optical proximity correction, Semiconducting wafers, Photomasks, Performance modeling, Electroluminescence, Mask making, Scanning electron microscopy, Wafer testing, Lithography

Showing 5 of 14 publications
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