Dr. Hyuk Joo Kwon
Senior Manager at SUNY Poly SEMATECH
SPIE Involvement:
Author
Publications (27)

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Multilayers, Finite-difference time-domain method, Chemical species, Inspection, Atomic force microscopy, Transmission electron microscopy, Monte Carlo methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

SPIE Journal Paper | February 6, 2013
JM3 Vol. 12 Issue 01
KEYWORDS: Extreme ultraviolet, Transmission electron microscopy, Metrology, Scanning electron microscopy, Particles, Photomasks, Multilayers, Ion beams, Smoothing, Molybdenum

PROCEEDINGS ARTICLE | April 17, 2012
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Electron beam lithography, Defect detection, Deep ultraviolet, Inspection, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Signal detection

PROCEEDINGS ARTICLE | April 17, 2012
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Metrology, Spectroscopy, Ions, Atomic force microscopy, Scanning electron microscopy, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Deposition processes

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Multilayers, Chemical species, Ions, Surface roughness, Atomic force microscopy, Transmission electron microscopy, Ion beams, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | March 21, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Electron beam lithography, Defect detection, Inspection, Atomic force microscopy, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Double positive medium

Showing 5 of 27 publications
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