Hyun Duck Shin
Process Engineer at Hynix Semiconductor Inc
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Etching, Ions, Chromium, Oxygen, Photomasks, Plasma etching, Critical dimension metrology, Chlorine, Molybdenum, Plasma treatment

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