Hyun Jin Kim
Manager at Dongjin Semichem Co Ltd
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Photoresist materials, Polymers, Photoresist developing, Critical dimension metrology, Bottom antireflective coatings, Lithography, Reflectivity, Double patterning technology, Etching, Temperature metrology

PROCEEDINGS ARTICLE | March 26, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Reflectivity, Etching, Refractive index, Semiconductors, Photoresist processing, Polymers, Lithography, Photorefractive polymers, Photoresist materials, Materials processing

PROCEEDINGS ARTICLE | March 23, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Polymers, Line edge roughness, Lithography, Diffusion, Extreme ultraviolet lithography, Molecules, Image resolution, Photoresist processing, Reflectivity, Image processing

PROCEEDINGS ARTICLE | June 12, 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Diffusion, Lithography, Polymers, Silicon, Line edge roughness, Chemically amplified resists, Photoresist processing, Semiconducting wafers, Coating, Etching

PROCEEDINGS ARTICLE | July 24, 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Polymers, Line edge roughness, Carbonates, Lithography, Interfaces, Hydrogen, Molecules, Annealing, Diffusion, Chemically amplified resists

PROCEEDINGS ARTICLE | July 24, 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Polymers, Lithography, Line edge roughness, Polymerization, Transmittance, Scanning electron microscopy, Etching, Manganese, Chemically amplified resists, Edge roughness

Showing 5 of 7 publications
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