Hyun Jin Kim
Manager at Dongjin Semichem Co Ltd
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Etching, Polymers, Reflectivity, Photoresist materials, Double patterning technology, Critical dimension metrology, Photoresist developing, Temperature metrology, Bottom antireflective coatings

PROCEEDINGS ARTICLE | March 26, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Semiconductors, Lithography, Refractive index, Etching, Polymers, Materials processing, Reflectivity, Photoresist materials, Photoresist processing, Photorefractive polymers

PROCEEDINGS ARTICLE | March 23, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Polymers, Image processing, Molecules, Diffusion, Reflectivity, Image resolution, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing

PROCEEDINGS ARTICLE | June 12, 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Etching, Polymers, Silicon, Diffusion, Coating, Line edge roughness, Photoresist processing, Semiconducting wafers, Chemically amplified resists

PROCEEDINGS ARTICLE | July 24, 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithography, Polymers, Annealing, Molecules, Interfaces, Hydrogen, Diffusion, Carbonates, Line edge roughness, Chemically amplified resists

PROCEEDINGS ARTICLE | July 24, 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithography, Etching, Polymers, Scanning electron microscopy, Transmittance, Polymerization, Manganese, Line edge roughness, Edge roughness, Chemically amplified resists

Showing 5 of 7 publications
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