Hyung-Do Kim
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Semiconductors, Lithography, Etching, Control systems, Photomasks, Transistors, Double patterning technology, Spatial resolution, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 14 May 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Optical lithography, Etching, Materials processing, Optical proximity correction, Chemical reactions, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 28 August 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, Logic, Scanners, Manufacturing, Scanning electron microscopy, Photomasks, Logic devices, Nanoimprint lithography, Semiconducting wafers, Phase shifts

Proceedings Article | 12 June 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Electron beams, Etching, Polymers, Coating, Reliability, Resistance, Scanning electron microscopy, Line edge roughness, Photoresist processing

Proceedings Article | 30 July 2002
Proc. SPIE. 4691, Optical Microlithography XV
KEYWORDS: Lithography, Optical lithography, Roads, Scanners, Electroluminescence, Image quality, Image transmission, Transmittance, Photomasks, Nanoimprint lithography

Showing 5 of 6 publications
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