Hyung-Joo Lee
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | May 10, 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Semiconductors, Metrology, Statistical analysis, Image processing, Scanning electron microscopy, Image quality, Photomasks, Optical proximity correction, Critical dimension metrology, Neodymium

PROCEEDINGS ARTICLE | July 28, 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Semiconductors, Lithography, Metrology, Error analysis, Reliability, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Tolerancing

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Semiconductors, Manufacturing, Control systems, Telecommunications, Process control, Photomasks, Extreme ultraviolet, Mask making, Semiconducting wafers, Wafer manufacturing

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Semiconductors, Lithography, Edge detection, Detection and tracking algorithms, Scanning electron microscopy, Optical metrology, Photomasks, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | June 12, 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Optical lithography, Calibration, Interfaces, Solids, Chemical analysis, Analytical research, Critical dimension metrology, Adhesives, Liquids

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