Hyung Joo Lee
at Univ of Texas at Austin
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 22 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Mathematical modeling, Metrology, Diffractive optical elements, Etching, Control systems, Oxygen, Scatterometry, Process control, Critical dimension metrology, Semiconducting wafers

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