Dr. Hyung Rae Lee
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Publications (7)

Proceedings Article | 27 March 2014 Paper
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Lithography, Etching, Polymers, Nitrogen, Scanning electron microscopy, Photoresist materials, Polymerization, Particle swarm optimization, Photoresist processing, Photoresist developing

Proceedings Article | 1 April 2009 Paper
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Etching, Reflectivity, Process control, Photomasks, Optical proximity correction, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers

Proceedings Article | 16 March 2009 Paper
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Diffraction, Reticles, Optical lithography, Polarization, Fourier transforms, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Fiber optic illuminators

Proceedings Article | 1 April 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Oxides, Lithography, Etching, Silicon, Reflectivity, Control systems, Photomasks, Critical dimension metrology, Semiconducting wafers, Chemical mechanical planarization

Proceedings Article | 4 May 2005 Paper
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Optical lithography, Etching, Dry etching, Silicon, Chemistry, Photomasks, Line width roughness, Photoresist processing, Semiconducting wafers

Showing 5 of 7 publications
  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top