Hyungjoo Shin
PhD Candidate at
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Mirrors, Contamination, Etching, Ions, Extreme ultraviolet, Plasma etching, Reactive ion etching, Chlorine, Plasma, Tin

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Mirrors, Contamination, Reflectivity, Photodiodes, Extreme ultraviolet, Chlorine, Plasma systems, Chlorine gas, Plasma, Tin

PROCEEDINGS ARTICLE | April 9, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Contamination, Particles, Dielectrics, Electrons, Silicon, Photomasks, Extreme ultraviolet, Semiconducting wafers, Ruthenium, Plasma

PROCEEDINGS ARTICLE | March 21, 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Mirrors, Etching, Ions, Xenon, Extreme ultraviolet, Extreme ultraviolet lithography, Chlorine, Ruthenium, Plasma, Tin

PROCEEDINGS ARTICLE | April 5, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Contamination, Capacitors, Sputter deposition, Particles, Electrons, Ions, Process control, Extreme ultraviolet, Ruthenium, Plasma

PROCEEDINGS ARTICLE | April 5, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Mirrors, Etching, Sputter deposition, Extreme ultraviolet, Extreme ultraviolet lithography, Reactive ion etching, Ruthenium, EUV optics, Plasma, Tin

Showing 5 of 8 publications
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