Hyungju Ryu
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 15 May 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Data modeling, Calibration, Photons, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Nanoimprint lithography, Line edge roughness, Stochastic processes

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