Hyungwon Yoo
at Hitachi High-Tech Korea Co Ltd
SPIE Involvement:
Publications (4)

Proceedings Article | 10 April 2013 Paper
Jaehyoung Oh, Gwangmin Kwon, Daiyoung Mun, Hyungwon Yoo, Sungsu Kim, Tae hui Kim, Minoru Harada, Yohei Minekawa, Fumihiko Fukunaga, Mari Nozoe
Proceedings Volume 8681, 868111 (2013) https://doi.org/10.1117/12.2010728
KEYWORDS: Overlay metrology, Scanning electron microscopy, Semiconducting wafers, Sensors, Image segmentation, Image processing, Error analysis, Measurement devices, Detection and tracking algorithms, Metrology

Proceedings Article | 5 April 2012 Paper
J. H. Oh, G. Kwon, D. Y. Mun, H. W. Yoo, Y. S. Choi, T. H. Kim, F. Fukunaga, S. Umehara, M. Nozoe
Proceedings Volume 8324, 83242P (2012) https://doi.org/10.1117/12.916244
KEYWORDS: Inspection, Image processing, Scanning electron microscopy, Defect detection, Sensors, Semiconductors, Image resolution, Bridges, Defect inspection, Image sensors

Proceedings Article | 5 April 2012 Paper
S. Babin, S Borisov, G. Kwon, C. H. Lee, J. H. Oh, D. Y. Mun, H. W. Yoo
Proceedings Volume 8324, 832428 (2012) https://doi.org/10.1117/12.916441
KEYWORDS: Monte Carlo methods, Scanning electron microscopy, Defect inspection, Metrology, Particles, Sensors, 3D modeling, Inspection, Oxides, Optical simulations

Proceedings Article | 2 April 2010 Paper
Dae Jong Kim, Hyung Won Yoo, Chul Hong Kim, Hak Kwon Lee, Sung Su Kim, Koon Ho Bae, Hedvi Spielberg, Yun Ho Lee, Shimon Levi, Yariv Bustan, Moshe Rozentsvige
Proceedings Volume 7638, 76380B (2010) https://doi.org/10.1117/12.848699
KEYWORDS: Semiconducting wafers, Polarization, Line edge roughness, Critical dimension metrology, Wafer inspection, Process control, Metrology, Photomasks, Light scattering, Semiconductors

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