Dr. Hyun-Su Kim
at Paul Scherrer Institute
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 19 October 2020 Presentation + Paper
Proc. SPIE. 11518, Photomask Technology 2020
KEYWORDS: Diffraction, Sensors, Image processing, Inspection, Image resolution, Image quality, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Reconstruction algorithms

Proceedings Article | 12 October 2020 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Diffraction, Coherence imaging, Lithographic illumination, Defect detection, Inspection, Image quality, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Reconstruction algorithms

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Microscopes, Coherence imaging, Imaging systems, Sensors, Inspection, Reflectivity, Photomasks, Extreme ultraviolet

Proceedings Article | 18 March 2016 Paper
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Photoresist materials, Photomasks, Extreme ultraviolet, Spatial coherence, Extreme ultraviolet lithography, Modulation transfer functions, Semiconducting wafers

Proceedings Article | 22 September 2015 Paper
Proc. SPIE. 9589, X-Ray Lasers and Coherent X-Ray Sources: Development and Applications XI
KEYWORDS: Diffraction, Coherence imaging, Mirrors, Coherence (optics), Cameras, Signal attenuation, Microscopy, Extreme ultraviolet, Aluminum, Visibility

Showing 5 of 9 publications
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