Hyunsuk Bang
at Toppan Photomask Korea Ltd
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 8 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Etching, Reactive ion etching, Quartz, Critical dimension metrology, Ions, Photomasks, Diffractive optical elements, Plasma, Atomic force microscopy, Phase shifts

Proceedings Article | 5 September 2001
Proc. SPIE. 4409, Photomask and Next-Generation Lithography Mask Technology VIII
KEYWORDS: Critical dimension metrology, Dry etching, Etching, Photomasks, Lithography, Standards development, Wet etching, Target detection, Mask making, Semiconducting wafers

Proceedings Article | 22 January 2001
Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Critical dimension metrology, Logic, Image processing, Overlay metrology, Computer aided design, Manufacturing, Dry etching, Transistors, Etching

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