I. Hsing Huang
Technical Manager at United Microelectronics Corp
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 10 May 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Optical design, Metrology, Metals, Image processing, Tungsten, Manufacturing, Optical alignment, Semiconducting wafers, Overlay metrology, Chemical mechanical planarization

Proceedings Article | 4 May 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Optical lithography, Etching, Copper, Coating, Scanning electron microscopy, Photoresist materials, Critical dimension metrology, Semiconducting wafers, Optics manufacturing

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Monochromatic aberrations, Reticles, Scanning electron microscopy, Image transmission, Transmittance, Photomasks, Critical dimension metrology, Binary data, Phase shifts

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Optical lithography, Coherence (optics), Image processing, Chromium, Photoresist materials, Optical proximity correction, Line edge roughness, 193nm lithography, Resolution enhancement technologies

Proceedings Article | 14 May 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Reticles, Etching, Metals, Glasses, Scanning electron microscopy, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers

Showing 5 of 9 publications
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