Dr. Il-Yong Jang
Senior Engineer at SUNY Poly SEMATECH
SPIE Involvement:
Author
Publications (20)

PROCEEDINGS ARTICLE | November 17, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Etching, Argon, Dry etching, Chromium, Emission spectroscopy, Photomasks, Plasma etching, Critical dimension metrology, Chlorine, Plasma

SPIE Journal Paper | May 15, 2015
JM3 Vol. 14 Issue 02
KEYWORDS: Extreme ultraviolet, Photomasks, Multilayers, Chemical species, Inspection, Computer simulations, Interfaces, Transmission electron microscopy, Modeling and simulation, Waveguides

PROCEEDINGS ARTICLE | March 16, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Multilayers, Waveguides, Chemical species, Inspection, Computer simulations, Transmission electron microscopy, Monte Carlo methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | July 28, 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Oxides, Interfaces, Silicon, Oxygen, Finite element methods, Photomasks, Extreme ultraviolet, Neodymium, Ruthenium, Oxidation

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Multilayers, Finite-difference time-domain method, Chemical species, Inspection, Atomic force microscopy, Transmission electron microscopy, Monte Carlo methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Silica, Ultraviolet radiation, Annealing, Oxygen, Scanning electron microscopy, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium

Showing 5 of 20 publications
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