Dr. Iacopo Mochi
Optical Physicist at Paul Scherrer Institut
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Publications (67)

PROCEEDINGS ARTICLE | October 26, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Lithography, Light sources, Optical lithography, Photomasks, Extreme ultraviolet, Semiconductor manufacturing, Extreme ultraviolet lithography, High volume manufacturing, Laser sintering, Diffraction gratings

PROCEEDINGS ARTICLE | October 15, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Diffraction, Reticles, Inspection, Image restoration, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, System on a chip, Defect inspection

PROCEEDINGS ARTICLE | October 12, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Lithography, Diffraction, Polarization, Silicon, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Diffraction gratings

PROCEEDINGS ARTICLE | October 3, 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Diffraction, Reticles, Scattering, Coating, Inspection, Pellicles, Image quality, Extreme ultraviolet

PROCEEDINGS ARTICLE | March 27, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Lithography, Diffraction, Optical lithography, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Semiconducting wafers, Diffraction gratings

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Signal to noise ratio, Mirrors, Optical properties, Nickel, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Phase measurement, Absorption

Showing 5 of 67 publications
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