Dr. Iacopo Mochi
Optical Physicist at Paul Scherrer Institut
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Publications (80)

Proceedings Article | 4 May 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Optical lithography, Fourier transforms, Electroluminescence, Scanning electron microscopy, Printing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Diffraction gratings

Proceedings Article | 23 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Microscopes, Coherence imaging, Imaging systems, Sensors, Inspection, Reflectivity, Photomasks, Extreme ultraviolet

SPIE Journal Paper | 30 January 2020
JM3 Vol. 19 Issue 01
KEYWORDS: Extreme ultraviolet, Carbon, Reticles, Inspection, Defect detection, Coherence imaging, Photomasks, Phase measurement, Reflectivity, Microscopes

Proceedings Article | 9 October 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Lithography, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Diffraction gratings

Proceedings Article | 29 September 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Diffraction, Reticles, Error analysis, Inspection, Phase retrieval, Image quality, Photomasks, Extreme ultraviolet, Reconstruction algorithms

Showing 5 of 80 publications
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