Ian Stobert
Distinguished Member of Technical Staff at GLOBALFOUNDRIES
SPIE Involvement:
Author
Publications (23)

Proceedings Article | 17 October 2019
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Signal attenuation, Silicon, Inspection, Photonics, Photomasks, Optical proximity correction, Mask making, Silicon photonics, Semiconducting wafers, Data corrections

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Reticles, Metrology, Data modeling, Silicon, Photomasks, Optical proximity correction, Semiconducting wafers, TCAD, Performance modeling, Overlay metrology

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Image segmentation, Manufacturing, Inspection, Scanning electron microscopy, Frequency modulation, Photomasks, Extreme ultraviolet, Fermium, Image classification, Semiconducting wafers

Proceedings Article | 23 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Reticles, Defect detection, Opacity, Inspection, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 29 March 2013
Proc. SPIE. 8685, Advanced Etch Technology for Nanopatterning II
KEYWORDS: Lithography, Data modeling, Etching, Silicon, Printing, Photomasks, Extreme ultraviolet, Optical proximity correction, Critical dimension metrology, Model-based design

Showing 5 of 23 publications
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