Dr. Ian R. Wallhead
at
SPIE Involvement:
Author
Area of Expertise:
Optical design , Automotive optics , Extreme UV , Laser projection , Illumination systems , Laser processing
Profile Summary

Ian received his B.Sc. in Physics from the University of York (UK) in 1986 and his Ph.D from the Open University (UK) in 1995. Over the last 30 years he has worked across a wide spectrum of optical engineering projects from thermal infra-red to extreme ultra-violet and in doing so has designed and developed optical systems in fields of optical metrology, laser micromachining, microlithography, solar collection, solid state illumination, diffractive optics and projection display. More recently he has been optics for autonomous vehicles.

He is also a member of the Institute of Physics, the Optical Society of America, the European Optical Society.

He is also a member of the AENOR (Spanish Association for Standards and Certification) committee on Laser Systems and Electro Optics and of the IEEE P2020 working group on automotive image quality.

He is a Chartered Physicist and Chartered Engineer.
Publications (8)

PROCEEDINGS ARTICLE | May 15, 2014
Proc. SPIE. 9138, Optics, Photonics, and Digital Technologies for Multimedia Applications III
KEYWORDS: Eye, Safety, FDA class II medical device development, Laser applications, LCDs, Projection systems, Laser safety, Projection devices, Lead, Pico projectors

PROCEEDINGS ARTICLE | May 1, 2014
Proc. SPIE. 9135, Laser Sources and Applications II
KEYWORDS: Optical components, Laser sources, Safety, Imaging systems, Cameras, LIDAR, Nd:YAG lasers, Gated imaging, Laser safety, Pulsed laser operation

PROCEEDINGS ARTICLE | December 18, 2012
Proc. SPIE. 8550, Optical Systems Design 2012
KEYWORDS: Microelectromechanical systems, Mirrors, Optical design, Prisms, Distortion, Head, Collimation, Beam shaping, Prototyping, Pico projectors

PROCEEDINGS ARTICLE | March 22, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Microscopes, Reticles, Imaging systems, Particles, Inspection, Image analysis, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Vibration isolation

PROCEEDINGS ARTICLE | November 8, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Microscopes, Mirrors, Reticles, Imaging systems, Scintillators, Inspection, Objectives, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics

PROCEEDINGS ARTICLE | May 6, 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Microscopes, Mirrors, Reticles, Scintillators, Inspection, Objectives, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics

Showing 5 of 8 publications
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