Ichihiro Aratani
at Kuraray Co Ltd
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Carbon, Chemical species, Polymers, Sulfur, Hydrogen, Oxygen, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Absorption

Proceedings Article | 22 March 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Polymers, Molecules, Coating, Atomic force microscopy, Polymerization, Atomic force microscope, Line edge roughness, Polymer thin films, Chemically amplified resists

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Thin films, Lithography, Oscillators, Quartz, Polymers, Crystals, Line edge roughness, Photoresist processing, Polymer thin films, Absorption

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