Dr. Ichiki Takemoto
Senior Research Associate at Sumitomo Chemical Co Ltd
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Line edge roughness, Lithography, Extreme ultraviolet lithography, Ions, Extreme ultraviolet, Polymers, Photoresist materials, Chemical analysis, Molecules, Chemically amplified resists

Proceedings Article | 3 April 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Polymers, Surface properties, Fluorine, Polymer thin films, Thin films, Lithography, Chemical analysis, X-rays, Photoemission spectroscopy, Interfaces

Proceedings Article | 11 April 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Line width roughness, Polymers, Diffusion, Semiconducting wafers, Immersion lithography, Photoresist materials, Lithography, Photoresist developing, Scanners, Molecules

Proceedings Article | 4 May 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Polymers, Photoresist processing, Glasses, Carbon monoxide, Lithography, Carbon, Chemical species, Line edge roughness, Diffusion, Molecules

Proceedings Article | 11 June 1999
Proc. SPIE. 3678, Advances in Resist Technology and Processing XVI
KEYWORDS: Silicon, Standards development, Transmittance, Lithium, Polymerization, Lithography, Head-mounted displays, Analytical research, Dry etching, Resistance

Proceedings Article | 29 June 1998
Proc. SPIE. 3333, Advances in Resist Technology and Processing XV
KEYWORDS: Standards development, Lithography, Resistance, Polymers, Transparency, Dry etching, Silicon, Polymerization, Analytical research, 193nm lithography

Showing 5 of 6 publications
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