Ichiro Mori
Consultant at FUJIFILM Electronic Materials Co Ltd
SPIE Involvement:
Publications (37)

Proceedings Article | 18 March 2016 Paper
Proceedings Volume 9776, 97761G (2016) https://doi.org/10.1117/12.2222747
KEYWORDS: Inspection, Photomasks, Extreme ultraviolet lithography, Light scattering, Multilayers, Defect detection, Extreme ultraviolet, Semiconducting wafers, Lithographic illumination, Mirrors, EUV optics, CCD cameras

Proceedings Article | 9 July 2015 Paper
Proceedings Volume 9658, 96580O (2015) https://doi.org/10.1117/12.2197309
KEYWORDS: Inspection, Mirrors, Lithographic illumination, Extreme ultraviolet, Defect detection, Photomasks, Ray tracing, Data modeling, Extreme ultraviolet lithography, High volume manufacturing

Proceedings Article | 28 July 2014 Paper
Proceedings Volume 9256, 92560O (2014) https://doi.org/10.1117/12.2069197
KEYWORDS: Inspection, Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Image classification, Mirrors, Geometrical optics, Ray tracing, Lithography, Manufacturing

Proceedings Article | 28 June 2013 Paper
Proceedings Volume 8701, 870118 (2013) https://doi.org/10.1117/12.2030712
KEYWORDS: Inspection, Mirrors, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Charge-coupled devices, Defect detection, Multilayers, Switches, Ions

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 86790I (2013) https://doi.org/10.1117/12.2011776
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Defect inspection, Prototyping, Extreme ultraviolet lithography, Defect detection, High volume manufacturing, Metrology, Mirrors

Showing 5 of 37 publications
Proceedings Volume Editor (1)

Conference Committee Involvement (1)
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
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